Leader: Safi Jradi


People involved:

Gilles Lerondel, Jerome Plain, Anne-Laure Baudrion, Sergei Kostcheev, Rafael Salas Montiel, Regis Deturche, Julien Proust and Jeremie Beal.



Christophe Couteau, Davy Gerard, Safi Jradi, Thomas Maurer, Jerome Martin, Cyrille Vezy, Delphine Retraint, Anisha Gokarna, Agnieszka Gwiazda, Abdelhamid Hmima, Irene Izquierdo Lorenzo, Anna Rumyantseva, Andre Santos, Souhail Ben Afia, Marcelina Cardoso dos Santos, Zeinab Chehadi, Intissar Frih, Wei Geng, Joyce Ibrahim, Mohammad Khaywah, Adrien Lalisse, David Legrand, Thomas Lerond, Joseph Marae-Djouda, Johnny Moughames, Rana Nicolas, Komla Nomenyo, Rohit Prasat, Yubing Pu, Nancy Rahbany, Lina Riachy, Jeremy Rouxel, Silvere Schuermans, Daniella Tchana Nkonta, Ricardo Tellez Limon, Zhongmeng Wen, Peng Ying, Xiaohui Zhang and Yinping Zhang.


Legend: (a) Bow-Tie nanostructure realized by e-beam lithography. (b) Gold nanoparticles obtained by colloidal synthesis. (c) 3D polymer structure obtained with the Nanoscribe ® system. (d) ZnO pattern obtained after a self-assembly process.


The sixth LNIO research group called Nanomanufacturing is a transverse research group as it involves a large number of LNIO members. The main goal of this research topic is to identify the Nanomanufacturing skills and processes developed by the users and to share them through an intranet website. The permanent staff involved into this research group is also responsible for user trainings on all the different nanomanufacturing machines (SEM-FEG, AFM, RIE...).



Most of the structures are fabricated by means of ebeam lithography and lift-off process. The chemical synthesis of colloidal nanoparticles has been developed to fabricate nanostructures with sizes smaller than the resolution limit of the e-beam lithography. Moreover, surface functionnalization technics (in liquid and gaz phase) have been developed to avoid the use of adhesion layers (as chromium or titanium oxyde). Large scale periodic structures can also be obtained by UV lithography, holography or nano-imprint. Some wet or dry etching processes can help to transfer the nanostructures directly into the substrate. Finally, the 2-photons-photopolymerization allows us to obtain polymer nanostructures in 3 dimensions.



The Nanomanufacturing research group relies on the NANO'MAT technological platform ( The LNIO members are allowed to use a SEM microscope (SE3500N Hitachi), a SEM-FEG microscope (SU8030 Hitachi), an e-beam lithography system (eLine Raith). Moreover, 3 PVD machines (Joule and e-beam), a magnetron sputtering machine, a Reactive Ion Etching system and an RTA/RTO oven are available. For the large scale patterning, an MJBU mask aligner (from Suss Microtec) mounted with the nano-imprint option is also available. Finally, the 2-photons-polymerization is realize thanks to the "Nanoscribe" sytem.

It is important to note that all the equipments will be located in 800 m2 of clean rooms (iso5 and iso8) at the beginning of 2015.

Legend: Self-assembly of polystyrene spheres with (a) and without (b) nanocylinders realized by e-beam lithography. (c) ZnO nanowire contacted by microscopic electrodes by means of e-beam lithography. (d) Silver nanorods fabricated by colloidal synthesis and deposited onto a silicon substrate.